What is High NA EUV and why is it needed?

High NA EUV is an advanced lithographic technology that uses extreme ultraviolet radiation with an increased numerical aperture (0.55 compared to 0.33 in previous generations). It enables the printing of smaller and denser circuits on silicon wafers, which is essential for further scaling of semiconductor technologies.

What advantages does High NA EUV offer for chip production?

The technology enhances lithographic resolution and precision, reducing reliance on complex multi-patterning processes. This simplifies manufacturing, improves circuit quality, and potentially increases transistor density in future processors.

Which Intel processors use High NA EUV?

Intel employs High NA EUV for select layers of Intel Core Ultra Series 3 (Panther Lake) processors manufactured on the Intel 18A process. While not yet used across all chip layers, the technology is already integrated into high-volume production.

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Hardware

Intel First to Mass-Produce Chips Using ASML’s High NA EUV Lithography

July 15, 2026

Photo: Tom's Hardware

Quick answer

Intel has become the world’s first company to mass-produce logic chips using ASML’s High NA EUV lithography for Panther Lake processors on the Intel 18A process node.

Intel has become the first company in the world to initiate mass production of logic chips using ASML’s High NA EUV lithography. The technology is applied to select layers of Intel Core Ultra Series 3 (Panther Lake) processors, manufactured on the Intel 18A process node. ASML has officially confirmed this milestone, noting that the yield of functional chips on the new equipment matches the performance of existing EUV systems.

High NA EUV represents the next generation of lithographic systems, enabling the printing of smaller and more complex circuits on silicon wafers. Unlike traditional EUV scanners with a numerical aperture of 0.33, the new technology uses an aperture of 0.55, delivering higher resolution and precision. This is critical for further semiconductor scaling, particularly amid growing demand for computational power in AI-driven applications.

Intel has not yet applied High NA EUV to all layers of the Panther Lake chip but only to the most precision-critical ones. The remaining components continue to be produced using conventional lithographic methods. This phased approach allows the company to gradually integrate the new technology while maintaining production flexibility and optimizing yield rates. In the future, High NA EUV is expected to be used across a broader range of layers, including the Intel 14A process node.

According to ASML CEO Christophe Fouquet, the adoption of High NA EUV unlocks new possibilities for creating denser and more powerful chips. The technology reduces dependence on multi-patterning processes, streamlining production and enhancing the quality of end products. This is particularly relevant for next-generation processors, where demands for transistor density and energy efficiency continue to rise.

Common questions

What is High NA EUV and why is it needed?: High NA EUV is an advanced lithographic technology that uses extreme ultraviolet radiation with an increased numerical aperture (0.55 compared to 0.33 in previous generations). It enables the printing of smaller and denser circuits on silicon wafers, which is essential for further scaling of semiconductor technologies.
What advantages does High NA EUV offer for chip production?: The technology enhances lithographic resolution and precision, reducing reliance on complex multi-patterning processes. This simplifies manufacturing, improves circuit quality, and potentially increases transistor density in future processors.
Which Intel processors use High NA EUV?: Intel employs High NA EUV for select layers of Intel Core Ultra Series 3 (Panther Lake) processors manufactured on the Intel 18A process. While not yet used across all chip layers, the technology is already integrated into high-volume production.

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